Minh D. Nguyen,Huiyu Yuan, Evert P. Houwman, Matthijn Dekkers, Gertjan Koster, Johan E. ten Elshof, and Guus Rijnders
ACS Appl. Mater. Interfaces, Article ASAP, Publication Date (Web): October 26, 2016 (2016)
Ca2Nb3O10 (CNOns) and Ti0.87O2 (TiOns) metal oxide nanosheets (ns) are used as a buffer layer for epitaxial growth of piezoelectric capacitor stacks on Si and Pt/Ti/SiO2/Si (Pt/Si) substrates. Highly (001)- and (110)-oriented Pulsed Laser Deposited PZT films are achieved by utilizing CNOns and TiOns, respectively. The devices grown on nanosheets/Pt/Si show significantly improved polarization fatigue properties over those of similar devices grown directly on Pt/Si. The differences in properties are ascribed to differences in the crystalline structures and the density of the films. These results show a route toward the fabrication of single crystal piezoelectric thin films and devices with high quality, long-lifetime piezoelectric capacitor structures on nonperovskite and even noncrystalline substrates such as glass or polished metal surfaces.
